MIRAI INTEX has unveiled its expanded MX SEMI lineup, featuring innovative multichannel chillers tailored for semiconductor applications like Deep Reactive Ion Etching (DRIE) and Cryogenic Etching. Utilizing air cycle technology, these chillers set new standards for performance, precision, and sustainability in the industry.
The lineup includes two models: the MIRAI XS 20 with 20 kW motor power and the MIRAI XS 40 with 40 kW.
Key Features:
- Sustainable Technology: Using air as a refrigerant, the MX SEMI eliminates harmful chemicals and complies with F-Gas Regulations, offering zero Global Warming Potential (GWP) and reducing carbon footprints.
- Multichannel Design: The chillers support multiple cooling circuits, facilitating flexible integration into diverse processes.
- Rapid Switch Over: Capable of switching between heating and cooling circuits in 30 seconds, enhancing production speed and throughput.
- Wide Temperature Range: Operating from -160°C to +90°C, it offers unmatched flexibility for various applications.
- Exceptional Precision: With an accuracy of ±0.025°C at idle and ±0.5°C during load changes, the chiller ensures reliable operations in sensitive environments.
- Compact Design: The space-efficient structure and Plug&Play connectivity enable easy installation and integration.
- Cost Efficiency: Low maintenance and high energy efficiency ensure a quick return on investment.
Designed specifically for DRIE and cryogenic etching, the MX SEMI chillers offer an ideal solution for sustainable semiconductor manufacturing, optimizing efficiency and supporting environmental responsibility.
